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457 (0,122s) •

Project

Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas (GA14-03875S)

sputtering techniques without the need for high substrate bias voltages, high substrate temperatures and post-deposition annealing. Benefits of the new magnetron sputtering techniques with highly ionized pulsed plasmas wil...

JI - Kompositní materiály

  • 2014 - 2016
    • •
  • 5 985 tis. Kč
    • •
  • 5 985 tis. Kč
    • •
  • GA ČR
Project

Nanostructured coatings synthesized using highly reactive pulsed plasmas (GA17-08944S)

annealing. Benefits of the new magnetron sputtering techniques with highly ionized sputtering techniques with a pulsed reactive gas flow control and without the need, and thermochromic VO2-based films at low substrate temp...

JI - Kompositní materiály

  • 2017 - 2019
    • •
  • 6 288 tis. Kč
    • •
  • 4 743 tis. Kč
    • •
  • GA ČR
Project

Ion and electron emissions from solids (IAA1067801)

Ion and electron emissions from solids perturbed by a strong, spatially and temporally confined perturbation will be studied both experimentally and theoretically. The perturbations are caused by impact of heavy atomic particles, neutrals, singly or ...

BG - Jaderná, atomová a molekulová fyzika, urychlovače

  • 1998 - 2001
    • •
  • 2 794 tis. Kč
    • •
  • 738 tis. Kč
    • •
  • AV ČR
Project

High-performance thermochromic VO2-based coatings with a low transition temperature prepared using reactive pulsed plasmas (GA21-28277S)

magnetron sputtering with an effective pulsed oxygen flow control and oxygen injection into the high-density plasma in front of the sputtered V target without the need......

Coating and films

  • 2021 - 2023
    • •
  • 6 690 tis. Kč
    • •
  • 6 690 tis. Kč
    • •
  • GA ČR
Project

Magnetron sputtered nanolaminated coatings - prospective hard material with enhanced fracture toughness (GA19-03899S)

. The main goal of this project is to synthetize these coatings by ionized deposition...

Materials engineering

  • 2019 - 2022
    • •
  • 7 232 tis. Kč
    • •
  • 6 506 tis. Kč
    • •
  • GA ČR
Project

Plasma polymers prepared by RF sputtering of polymeric solids (1P05OC008)

study of sputtering of polymers, configuration of deposical parametres, sputtering of nylon...

BL - Fyzika plasmatu a výboje v plynech

  • 2005 - 2005
    • •
  • 244 tis. Kč
    • •
  • 122 tis. Kč
    • •
  • MŠMT
Project

*Rotatable sputter targets for high quality large area coating (FR-TI1/407)

*Development of production techology of rotatable high density sputter targets with adjustable morphology for high quality large area coatings......

JG - Hutnictví, kovové materiály

  • 2009 - 2012
    • •
  • 37 273 tis. Kč
    • •
  • 21 495 tis. Kč
    • •
  • MPO
Project

Sputtering equipment for funkcionel Cu coating (TC3-59)

Sputtering equipment for funkcionel Cu coating...

JJ - Ostatní materiály

  • 1997 - 1998
    • •
  • 9 000 tis. Kč
    • •
  • 4 000 tis. Kč
    • •
  • MH
Project

The development of technology and the introduction sputtering targets for the production of glass with a high heat reflectance. (FF-P/017)

Research and development of technology of sputtering targets for the production of glass with a high heat reflectance. The products must meet the high requirements for the purity of materials, a balanced and fine-grained structure and accura...

JG - Hutnictví, kovové materiály

  • 2002 - 2004
    • •
  • 19 789 tis. Kč
    • •
  • 4 710 tis. Kč
    • •
  • MPO
Project

Recycling precious metals in production, processing and using sputtering targets for CDR and DVD data porter. (FI-IM/071)

Project is concentrated on problems of recyclacion precious metals from waste created most of all in production sputtering targets and CDR and DVD data porters.......

JG - Hutnictví, kovové materiály

  • 2004 - 2006
    • •
  • 6 470 tis. Kč
    • •
  • 2 240 tis. Kč
    • •
  • MPO
  • 1 - 10 out of 457