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2 433 (0,098s) •

Project

Investigation of the influence of the discharge excitation type on the properties of the deposited films (OC 527.60)

generations are frquently used in plasma processing. The method of plasma excitation influences the internal plasma parameters. which determine the properties of the deposited film. The aim of the proposed project...

BL - Fyzika plasmatu a výboje v plynech

  • 2000 - 2005
    • •
  • 6 347 tis. Kč
    • •
  • 2 057 tis. Kč
    • •
  • MŠMT
Project

The design of the deposition apparatus for plasma polymerization processes (OC 527.30)

The design of the deposition apparatus and its vacuum components for plasma polymerization processes...

BL - Fyzika plasmatu a výboje v plynech

  • 2000 - 2005
    • •
  • 4 051 tis. Kč
    • •
  • 2 020 tis. Kč
    • •
  • MŠMT
Project

Investigation of the influence of the discharge excitation type on the properties of the deposited films (1P05OC017)

characterisation of standartised reactor for plasma polymerisation, plasma modification of powdery materials in reactor...

BL - Fyzika plasmatu a výboje v plynech

  • 2005 - 2005
    • •
  • 244 tis. Kč
    • •
  • 122 tis. Kč
    • •
  • MŠMT
Project

Free-standing deposits from less-common materials manufactured by plasma spraying and their basic characteristics (GA104/99/0304)

of the plasma deposited ceramics. These deposits exhibit an unusual phase compositionPlasma spraying is one of the fastest growing areas of industrial development and zirconates, are not yet used in plasma

CI - Průmyslová chemie a chemické inženýrství

  • 1999 - 2001
    • •
  • 2 522 tis. Kč
    • •
  • 1 926 tis. Kč
    • •
  • GA ČR
Project

Doped thin-layer structures of ZnO and TiO2 (KJB100100703)

Fabrication of co-doped thin-layer ZnO/TiO2 structures by reactive plasma deposition. "In-situ" plasma diagnostic in the deposition system based on emission spectroscopy, Langmuir time-resolved probes and mass spec...

BM - Fyzika pevných látek a magnetismus

  • 2007 - 2009
    • •
  • 1 764 tis. Kč
    • •
  • 1 764 tis. Kč
    • •
  • AV ČR
Project

An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron (GP202/09/P159)

The essence of suggested project is a purposeful investigation of plasma parameters in the low-pressure technological plasma reactors utilized for deposition mentioned plasma deposition systems. Therefore,...

BL - Fyzika plasmatu a výboje v plynech

  • 2009 - 2011
    • •
  • 719 tis. Kč
    • •
  • 719 tis. Kč
    • •
  • GA ČR
Project

Investigation of nanostructured thin films formation deposited by plasma assisted techniques (GA16-14024S)

The project aims at basic experimental research on border of plasma physics on dependence of the substrate morphology and plasma process parameters. The growth-oxides to plasma polymers will be studied. Different initial su...

BL - Fyzika plasmatu a výboje v plynech

  • 2016 - 2018
    • •
  • 7 143 tis. Kč
    • •
  • 6 444 tis. Kč
    • •
  • GA ČR
Project

Investigation of physical properties and applications of the low pressure plasma-chemical reactor with the system plasma jet channels for thin films deposition (GP202/02/P021)

of the plasma parameters will be done during the deposition of oriented polycrystalline ZnOProposal project deals with a study of plasma jet channels in the plasma chemical reactor with hollow cathodes during the ...

BL - Fyzika plasmatu a výboje v plynech

  • 2002 - 2004
    • •
  • 1 800 tis. Kč
    • •
  • 676 tis. Kč
    • •
  • GA ČR
Project

Study of plasma formed in hybrid arrangement of pulsed laser deposition (GA202/06/0216)

The hybrid laser deposition method (H-PLD) of thin layers is a new deposition technology combined the pulsed laser deposition with applied discharges or sources of plasma (DC, RF, hollow cathode discharges, combina...

BL - Fyzika plasmatu a výboje v plynech

  • 2006 - 2008
    • •
  • 1 945 tis. Kč
    • •
  • 1 945 tis. Kč
    • •
  • GA ČR
Project

Study of reactivity of organosilicon monomers in plasma environment (ME 489)

The low pressure plasma enhanced chemical vapour deposition (PECVD) of thin plasma polymers deposited from the mixture of HMDSO and oxygen., Further we on the deposition of a new kind of hard diamond-like ...

BL - Fyzika plasmatu a výboje v plynech

  • 2002 - 2005
    • •
  • 2 463 tis. Kč
    • •
  • 1 032 tis. Kč
    • •
  • MŠMT
  • 1 - 10 out of 2 433