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1 031 (0,143s) •

Project

New procedures for thin film deposition by reaktive magnetron sputtering (MEB020761)

Main goal of this cooperation is to develop powerfull diagnostics methods suitable for controling of physical processes taking place in PVD reactor.......

BL - Fyzika plasmatu a výboje v plynech

  • 2008 - 2008
    • •
  • 25 tis. Kč
    • •
  • 25 tis. Kč
    • •
  • MŠMT
Project

Nanostructured coatings synthesized using highly reactive pulsed plasmas (GA17-08944S)

and functional properties. They will be synthesized using new high-power impulse magnetron sputtering techniques with a pulsed reactive gas flow control and without the need annealing. Benefits of the new magnetron

JI - Kompositní materiály

  • 2017 - 2019
    • •
  • 6 288 tis. Kč
    • •
  • 4 743 tis. Kč
    • •
  • GA ČR
Project

Design of novel functional materials, and pathways for their reactive magnetron sputtering, using advanced computer simulations (GA19-14011S)

diagnostics through classical reactive magnetron sputtering to advanced techniques such a high-power impulse magnetron sputtering with a pulsed reactive gas flow control by magnetron

Coating and films

  • 2019 - 2021
    • •
  • 5 092 tis. Kč
    • •
  • 4 762 tis. Kč
    • •
  • GA ČR
Project

Novel preparation route of metallic coatings for medical applications (GP14-32801P)

will be deposited by magnetron sputtering using three different methods: reactive sputtering, non-reactive sputtering from two targets and nonreactive sputtering fromThe core objective o...

JI - Kompositní materiály

  • 2014 - 2016
    • •
  • 3 042 tis. Kč
    • •
  • 3 042 tis. Kč
    • •
  • GA ČR
Project

Magnetron sputtering of thin films (ME 173)

, process of selective reactive magnetron sputtering, segregation of atoms to boundariesThe development of a new generation of materials based on sputtered nanocomposite coatings. The project concentrates on the so...

BL - Fyzika plasmatu a výboje v plynech

  • 1998 - 2002
    • •
  • 10 600 tis. Kč
    • •
  • 2 100 tis. Kč
    • •
  • MŠMT
Project

Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials (FV30177)

The project aim is to develop and implement in the production practice most advanced, very recently published sputtering technologies based on High Power Impulse Magnetron Sputtering (HiPIMS) method. Specifically, it compri...

Textiles; including synthetic dyes, colours, fibres (nanoscale materials to be 2.10; biomaterials to be 2.9)

  • 2018 - 2021
    • •
  • 12 706 tis. Kč
    • •
  • 9 000 tis. Kč
    • •
  • MPO
Project

Numerical models for optimization of innovative superhard materials (FW03010533)

The project aims to develop a software for ion transport simulation in industrial pulsed deposition processes. This hybrid model will enable e.g. simulation of strongly unbalanced DC or pulsed DC magnetrons with substantially shorter computa...

Fluids and plasma physics (including surface physics)

  • 2021 - 2025
    • •
  • 19 618 tis. Kč
    • •
  • 13 642 tis. Kč
    • •
  • TA ČR
Project

Study of hybrid deposition process and its application for thin film deposition (GP202/08/P038)

as a source of carbon instead of its conventional sputtering from magnetron target of hydrocarbons will be performed. Advanced model of reactive sputtering assuming nonuniform......

BL - Fyzika plasmatu a výboje v plynech

  • 2008 - 2010
    • •
  • 1 125 tis. Kč
    • •
  • 1 125 tis. Kč
    • •
  • GA ČR
Project

Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas (GA14-03875S)

and functional properties. They will be synthesized using new high-power pulsed magnetron sputtering techniques without the need for high substrate bias voltages, high substrate temperatures and post-deposition annealing. Benefits ...

JI - Kompositní materiály

  • 2014 - 2016
    • •
  • 5 985 tis. Kč
    • •
  • 5 985 tis. Kč
    • •
  • GA ČR
Project

Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulfide layers (GA19-00579S)

Research in the Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS) field is still in its early stages mainly focusing on compound film characterisation rather than on the description of processes accompanying the d...

Fluids and plasma physics (including surface physics)

  • 2019 - 2021
    • •
  • 11 303 tis. Kč
    • •
  • 9 645 tis. Kč
    • •
  • GA ČR
  • 1 - 10 out of 1 031