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972 (0,162s) •

Project

*Applied lenses (FR-TI1/414)

*The project deals with a development of transmission diffractive structures supporting lighting created by point sources of light (LED). The diffractive structures are produced by e-beam lithography and are recombined into transpar...

BH - Optika, masery a lasery

  • 2009 - 2010
    • •
  • 5 538 tis. Kč
    • •
  • 3 059 tis. Kč
    • •
  • MPO
Project

Submicrometer relief diffractive structures made by electron-beam lithography. (IBS2065014)

E-beam lithography is generally recognized and used tool in microelectronics to generate geometrical patterns with feture siye under one micrometer. Considering e-beam lithography with the resolution of 0.1um it is...

JA - Elektronika a optoelektronika, elektrotechnika

  • 2000 - 2002
    • •
  • 2 088 tis. Kč
    • •
  • 1 433 tis. Kč
    • •
  • AV ČR
Project

Growth of nanostructures by electron beam (MEB020927)

We will combine techniques of electron lithoghraphy and OMCVD (Organic Molecule Chemical Vapor Deposition) for microelectronics, catalysis and gas sensor technology. E-beam irradiation will induce synthesis of compounds by using metal-organi...

BM - Fyzika pevných látek a magnetismus

  • 2009 - 2010
    • •
  • 106 tis. Kč
    • •
  • 106 tis. Kč
    • •
  • MŠMT
Project

Design and manufacturing of advanced diffractive optical elements and their application to the industry (FV40197)

by techniques of electron beam lithography. Optical and structural control of fabricated of optical Nanolmprint lithography. Design of hard stable form for imprint of diffractive and their fabrication by electron beam lithograp...

Optics (including laser optics and quantum optics)

  • 2019 - 2022
    • •
  • 22 829 tis. Kč
    • •
  • 14 970 tis. Kč
    • •
  • MPO
Project

Structures for spintronics and quantum phenomena created by electron beam lithography (KAN400100652)

structures will be created by a newly installed electron beam lithography....

BM - Fyzika pevných látek a magnetismus

  • 2006 - 2010
    • •
  • 54 436 tis. Kč
    • •
  • 54 436 tis. Kč
    • •
  • AV ČR
Project

CGH, synthetic hologram 3D (TH03020179)

This is research in the field of modern photonics and synthetic lithography. The aim is to bring to market a range of advanced technologies and products that meet the strictest safety criteria in the product (hologram). Results of the projec...

Optics (including laser optics and quantum optics)

  • 2018 - 2020
    • •
  • 4 550 tis. Kč
    • •
  • 2 371 tis. Kč
    • •
  • TA ČR
Project

Research and development of Security printing (EG15_018/0004777)

The core of the project is the research activity of electron lithography and the modernization of the lithograph as such. The aim of the project is: 1) Verified Technology - Technology of recording and laminating mesh structures for high c...

JR - Ostatní strojírenství

  • 2015 - 2021
    • •
  • 35 441 tis. Kč
    • •
  • 8 826 tis. Kč
    • •
  • MPO
Project

Výroba kovových nanostruktur pro aplikace ve spintronice (GPP102/12/P443)

and nanopatterning. The possibilities how the patterning process (FIB and e-beam lithography) can...

JA - Elektronika a optoelektronika, elektrotechnika

  • 2012 - 2014
    • •
  • 1 157 tis. Kč
    • •
  • 1 157 tis. Kč
    • •
  • GA ČR
Project

Optimization of electron-beam production technology (FR-TI1/576)

Important improvement of the actual technology....

JP - Průmyslové procesy a zpracování

  • 2009 - 2012
    • •
  • 15 004 tis. Kč
    • •
  • 11 724 tis. Kč
    • •
  • MPO
Project

Advanced nano/microstructure creation using ion and electron beam surface modification with potential use in microfluid and lab-on-chip applications (GA22-10536S)

electrons will be used for direct lithography and lithography using a mask to create...

Materials engineering

  • 2022 - 2024
    • •
  • 9 792 tis. Kč
    • •
  • 9 792 tis. Kč
    • •
  • GA ČR
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