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3 252 (0,092s)

Project

Optimization of electron-beam production technology (FR-TI1/576)

Important improvement of the actual technology....

JP - Průmyslové procesy a zpracování

  • 2009 - 2012
  • 15 004 tis. Kč
  • 11 724 tis. Kč
  • MPO
Project

Design and manufacturing of advanced diffractive optical elements and their application to the industry (FV40197)

by techniques of electron beam lithography. Optical and structural control of fabricated and their fabrication by electron beam lithography technique. Optical and structural control of electr...

Optics (including laser optics and quantum optics)

  • 2019 - 2022
  • 22 829 tis. Kč
  • 14 970 tis. Kč
  • MPO
Project

Structures for spintronics and quantum phenomena created by electron beam lithography (KAN400100652)

structures will be created by a newly installed electron beam lithography....

BM - Fyzika pevných látek a magnetismus

  • 2006 - 2010
  • 54 436 tis. Kč
  • 54 436 tis. Kč
  • AV ČR
Project

Submicrometer relief diffractive structures made by electron-beam lithography. (IBS2065014)

E-beam lithography is generally recognized and used tool in microelectronics to generate geometrical patterns with feture siye under one micrometer. Considering e-beam lithography with the resolution of 0.1um it is...

JA - Elektronika a optoelektronika, elektrotechnika

  • 2000 - 2002
  • 2 088 tis. Kč
  • 1 433 tis. Kč
  • AV ČR
Project

Electron-beam lithography for preparation of nanostructures (GA102/05/2325)

Actual electron-beam lithographic system BS 600 works with the limit resolution of 0.1 microns. Recently,we have received a couple of requirements for production of structures with better resolution.The aim of this project is to stu...

JA - Elektronika a optoelektronika, elektrotechnika

  • 2005 - 2006
  • 1 700 tis. Kč
  • 1 631 tis. Kč
  • GA ČR
Project

CGH, synthetic hologram 3D (TH03020179)

This is research in the field of modern photonics and synthetic lithography. The aim is to bring to market a range of advanced technologies and products that meet the strictest safety criteria in the product (hologram). Results of the projec...

Optics (including laser optics and quantum optics)

  • 2018 - 2020
  • 4 550 tis. Kč
  • 2 371 tis. Kč
  • TA ČR
Project

Growth of nanostructures by electron beam (MEB020927)

We will combine techniques of electron lithoghraphy and OMCVD (Organic Molecule Chemical Vapor Deposition) for microelectronics, catalysis and gas sensor technology. E-beam irradiation will induce synthesis of compounds by using met...

BM - Fyzika pevných látek a magnetismus

  • 2009 - 2010
  • 106 tis. Kč
  • 106 tis. Kč
  • MŠMT
Project

Theory of electron scattering for chemical lithography (OC09079)

by an electron impact in processes that of interest to chemical lithography, i.e at the molecular level is one of the great challenges of modern research. In electron beam be achieved by a low-energy electron<...

CF - Fyzikální chemie a teoretická chemie

  • 2009 - 2011
  • 1 250 tis. Kč
  • 1 250 tis. Kč
  • MŠMT
Project

Advanced nano/microstructure creation using ion and electron beam surface modification with potential use in microfluid and lab-on-chip applications (GA22-10536S)

electrons will be used for direct lithography and lithography using a mask to createThe interactions of energetic ions and electrons with the surfaces of thermoplastics and glasses will be used to obtain new hiera...

Materials engineering

  • 2022 - 2024
  • 9 792 tis. Kč
  • 9 792 tis. Kč
  • GA ČR
Project

CONJUGATED SILICON ? BASED POLYMER RESISTS FOR NANOTECHNOLOGIES (IAA100100622)

Classical optical and electron lithography continues to be the main technology electron-beams will thus have to undergo profound changes. Organic silicon nanostructural polymeric materials are a new group of el...

BM - Fyzika pevných látek a magnetismus

  • 2006 - 2009
  • 5 246 tis. Kč
  • 5 246 tis. Kč
  • AV ČR
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