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6 936 (0,123s)

Project

Research and development of advanced PVD/PECVD low-temperature plasma system for deposition of functional thin and thick TiO2 films for industrial applications. (TF01000084)

The main aim of the project is the design, development and implementation of modular hybrid PVD-PECVD deposition system for low-temperature deposition of pulsed hollow cathodes and will enable a fast deposition...

BL - Fyzika plasmatu a výboje v plynech

  • 2015 - 2018
  • 15 757 tis. Kč
  • 11 414 tis. Kč
  • TA ČR
Project

Low-temperature plasmatic deposition of polycrystalline and nanocrystalline oxide thin films by systems with hollow cathodes (KJB100100707)

The low temperature deposition of high quality oxide thin films by the multi-plasma jet system will be investigated. Advanced methods of 'in situ' plasma Ba1-xSrxTiO3 and PbZr1-xTixO3 thin films at low...

BL - Fyzika plasmatu a výboje v plynech

  • 2007 - 2009
  • 1 618 tis. Kč
  • 1 618 tis. Kč
  • AV ČR
Project

High-performance thermochromic VO2-based coatings with a low transition temperature prepared using reactive pulsed plasmas (GA21-28277S)

thermochromic VO2-based coatings with a low transition temperature. They will be deposited mainly onto soda-lime glass and ultrathin (0.1 mm) flexible glass using a novel low-temperature scalable depo...

Coating and films

  • 2021 - 2023
  • 6 690 tis. Kč
  • 6 690 tis. Kč
  • GA ČR
Project

Research and development of new plasma-activated ALD system with a unique source of low-temperature plasma based on microwave surfatron and ECWR discharge. (TF03000025)

The aim of the project is design, development and implementation of plasma ALD system for low-temperature deposition of thin dielectric and metal films will appropriately implement the low-temperature<...

BL - Fyzika plasmatu a výboje v plynech

  • 2016 - 2019
  • 27 370 tis. Kč
  • 20 124 tis. Kč
  • TA ČR
Project

New low temperature plasmatic technologies of thin films deposition at atmospheric pressure (IBS1010203)

environmentally safe plasmatic technologies of thin films at the low temperatures of the substrate T< 80 deg C. New systems with plasma jets working at atmospheric pressureswill transparent thin oxide films deposited

BL - Fyzika plasmatu a výboje v plynech

  • 2002 - 2005
  • 9 162 tis. Kč
  • 4 920 tis. Kč
  • AV ČR
Project

Investigation of Multi-Plasma-Jet System as a Source for Low Temperature Deposition of Perovskites Thin Films (KJB1010302)

The aim of the project will be investigation of the low pressure multi- plasma jet sputtering system used for the temperature deposition of thin film perovskites will be to obtain those films on polymer and plastic...

BL - Fyzika plasmatu a výboje v plynech

  • 2003 - 2005
  • 1 879 tis. Kč
  • 1 316 tis. Kč
  • AV ČR
Project

Investigation of new low temperature atmospheric pressure plasma sources for deposition of thin films (GA202/05/2242)

enviromentaly safe plasmatic technologies of thin films at the low temperatures of the substrate T< 80 deg C. New systems with plasma jets working at atmospheric pressures on the speciál thin oxide films deposited...

BL - Fyzika plasmatu a výboje v plynech

  • 2005 - 2007
  • 2 430 tis. Kč
  • 1 890 tis. Kč
  • GA ČR
Project

Low Temperature Plasma Deposition of Perovskite Thin Films on Base Metal and Polymer Substrates (GC202/09/J017)

the deposited film and the substrate at low deposition temperatures, film microstructure projectdeals with the research and optimization of a plasma-jet technology for low temperature

BL - Fyzika plasmatu a výboje v plynech

  • 2009 - 2011
  • 2 734 tis. Kč
  • 2 734 tis. Kč
  • GA ČR
Project

A study of impulse plasmatic systems for deposition of thin layers with applications in photonics (GA15-00863S)

The project aims at the experimental research of low temperature pulsed plasma generated in the systems of planar dc-magnetron and hollow cathode plasma jet. Advanced methods of plasma diagnostics will be ...

BL - Fyzika plasmatu a výboje v plynech

  • 2015 - 2017
  • 7 640 tis. Kč
  • 7 640 tis. Kč
  • GA ČR
Project

Hybrid high-density low-temperature microwave plasma sources in matrix configuration suitable for growth of advanced materials and their (nano) composites on 2D and 3D substrates (TA01011740)

of hybrid and fully modular microwave plasma assisted chemical vapor deposition system based on high-density cold-plasma generated by surfatron suitable for growth geometrically shapedsubstrates, large area, low <...

BL - Fyzika plasmatu a výboje v plynech

  • 2011 - 2014
  • 29 820 tis. Kč
  • 23 631 tis. Kč
  • TA ČR
  • 1 - 10 out of 6 936