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Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F21%3AN0000009" target="_blank" >RIV/00177016:_____/21:N0000009 - isvavai.cz</a>

  • Alternative codes found

    RIV/00216224:14310/21:00119065 RIV/00216305:26620/21:PU142107

  • Result on the web

    <a href="https://www.sciencedirect.com/science/article/pii/S0141391021001488" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0141391021001488</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.polymdegradstab.2021.109628" target="_blank" >10.1016/j.polymdegradstab.2021.109628</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments

  • Original language description

    In the present work, SiOCH coatings were prepared in capacitively coupled RF glow discharge from gaseous mixture of trimethylsilyl acetate (TMSAc) monomer and oxygen. Properties of thin solid films prepared using continuous wave (CW) plasma and pulsed wave (PW) plasma were examined, including long–term stability in contact with air and water environments. The presented study proves that it is possible to prepare organosilicon coatings showing properties in a wide range from soft organic polymeric structures to materials similar to SiO2 with Martens hardness of 4 GPa. The content of carbon species in organosilicon structure and water contact angle (WCA) decreased with increasing oxygen ratio from 7.7 % to 75.0 %. The water contact angle of TMSAc-based coatings prepared in CW mode decreased from 95° to 76°. The application of pulsed mode using an oxygen ratio of 50 % and pulse repetition frequencies in the range of 0.33 Hz to 300 Hz led to materials with hydrophobic character (WCA in range of 86°–94°) with increased content of CH and Si-CH structures in comparison to CW mode. This study proves that the aging mechanism significantly depends on deposition parameters. The increase of oxygen ratio, as well as the increase of pulse repetition frequency, led to the higher resistance towards the atmospheric environment. On the other side, organosilicon coatings prepared in CW mode using high oxygen ratios (50–75 %) showed significant delamination after immersion in water. However, the use of PW plasma for the preparation of SiOCH thin films significantly improved the stability of resulting materials under water environment.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10404 - Polymer science

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Polymer degradation and stability

  • ISSN

    0141-3910

  • e-ISSN

  • Volume of the periodical

    190

  • Issue of the periodical within the volume

    August 2021

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    19

  • Pages from-to

  • UT code for WoS article

    000679440900013

  • EID of the result in the Scopus database

    2-s2.0-85111071810