Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11310%2F17%3A10366698" target="_blank" >RIV/00216208:11310/17:10366698 - isvavai.cz</a>

Alternative codes found

RIV/00216208:11320/17:10366698

Result on the web

<a href="http://dx.doi.org/10.1002/ppap.201600256" target="_blank" >http://dx.doi.org/10.1002/ppap.201600256</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ppap.201600256" target="_blank" >10.1002/ppap.201600256</a>

Result language

angličtina

Original language name

Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment

Original language description

The nanocomposite films Ag/a-C:H were prepared by vacuum-based method which combines deposition of Ag nanoparticles by means of gas aggregation source (GAS) and PECVD deposition of a-C:H matrix. The matrix was deposited in a mixture of Ar and n-hexane on the substrates placed on the powered RF electrode facing the beam of Ag NPs from the GAS. Anisotropic plasma etching was used to increase Ag concentration on the surface of the coating. The influence of three types of plasma on the chemical composition of the coatings and on the size of Ag nanoparticles is described. It is shown that the best etching selectivity and thus the highest Ag surface concentration was reached in case of etching of grounded samples in low pressure oxygen plasma. This treatment enhances the short term antibacterial efficiency of produced coatings.

Czech name

—

Czech description

—

Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

<a href="/en/project/GA13-09853S" target="_blank" >GA13-09853S: Application of low temperature plasma in a gas aggregation cluster source for deposition of nanoparticles, nanostructured and nanocomposite films</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

—

Volume of the periodical

14

Issue of the periodical within the volume

11

Country of publishing house

DE - GERMANY

Number of pages

8

Pages from-to

—

UT code for WoS article

000415339700003

EID of the result in the Scopus database

2-s2.0-85021285822