Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F07%3A00004142" target="_blank" >RIV/00216208:11320/07:00004142 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet
Original language description
Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet
Czech name
Tok iontů na substrát během depozice tenkých vrstev v systému s plazmatickou tryskou
Czech description
Tok iontů na substrát během depozice tenkých vrstev v systému s plazmatickou tryskou

Project
<a href="/en/project/GA202%2F06%2F0776" target="_blank" >GA202/06/0776: Advanced research and development of low-temperature plasma sources</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2007
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
WDS´07 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
ISBN
978-80-7378-024-1
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
212-217
Publisher name
Matfyzpress
Place of publication
Prague
Event location
Prague
Event date
Jan 1, 2007
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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Result description