Low pressure plasma-jet systems and their application for deposition of ceramic thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F07%3A00004229" target="_blank" >RIV/00216208:11320/07:00004229 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Low pressure plasma-jet systems and their application for deposition of ceramic thin films
Original language description
Low pressure plasma-jet systems and their application for deposition of ceramic thin films
Czech name
Aplikace systému s plazmatickou tryskou pro depozici keramických tenkých vrstev
Czech description
Aplikace systému s plazmatickou tryskou pro depozici keramických tenkých vrstev
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2007
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Optoelectronics and Advanced Materials
ISSN
1454-4164
e-ISSN
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Volume of the periodical
9
Issue of the periodical within the volume
4
Country of publishing house
RO - ROMANIA
Number of pages
6
Pages from-to
875-880
UT code for WoS article
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EID of the result in the Scopus database
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