In-situ XRD astudy of thickness dependence of amorphous and nanocrystalline magnetron deposited TiO2 thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F08%3A00206068" target="_blank" >RIV/00216208:11320/08:00206068 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
In-situ XRD astudy of thickness dependence of amorphous and nanocrystalline magnetron deposited TiO2 thin films
Original language description
annotation in the original language In-situ XRD astudy of thickness dependence of crystallization of amorphous titanium dioxide films
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Acta Crystallographica. Section A. Foundations of Crystallography
ISSN
0108-7673
e-ISSN
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Volume of the periodical
64
Issue of the periodical within the volume
1
Country of publishing house
DK - DENMARK
Number of pages
559
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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