Sn-CeO2 thin films prepared by rf magnetron sputtering: XPS and SIMS study

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F09%3A00206886" target="_blank" >RIV/00216208:11320/09:00206886 - isvavai.cz</a>

Alternative codes found

RIV/00216305:26210/09:PU86162

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Sn-CeO2 thin films prepared by rf magnetron sputtering: XPS and SIMS study

Original language description

The purpose of this study was to contribute to the elucidation of the Sn-Ce interaction mechanism in mixed oxides prepared by simultaneous magnetron sputtering of ceria and tin. Non-reactive rf magnetron sputtering was used to deposit CeO2 and Sn-CeO2 thin films on Si(1 0 0) wafer substrates. The prepared samples were investigated by secondary ion mass spectroscopy (SIMS) and X-ray photoelectron spectroscopy (XPS) using a conventional laboratory X-ray source

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GD202%2F09%2FH041" target="_blank" >GD202/09/H041: Physics of nanostructures</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Applied Surface Science

ISSN

0169-4332

e-ISSN

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Volume of the periodical

255

Issue of the periodical within the volume

13-14

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

5

Pages from-to

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UT code for WoS article

000264925400040

EID of the result in the Scopus database

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