Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F09%3A00207230" target="_blank" >RIV/00216208:11320/09:00207230 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions

Original language description

Chemical-mechanical polishing of CdTe and Zn(x)Cd(1-x)Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H2O2(HNO3)-HBr-solvent has been investigated. The dependences of the chemical-mechanical polishing rate on thedilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GA102%2F09%2F1920" target="_blank" >GA102/09/1920: Stochastic Phenomena in MIS and MIM Semiconductor Structures</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Electronic Materials

ISSN

0361-5235

e-ISSN

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Volume of the periodical

38

Issue of the periodical within the volume

8

Country of publishing house

US - UNITED STATES

Number of pages

8

Pages from-to

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UT code for WoS article

000268745400020

EID of the result in the Scopus database

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