Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F12%3A10133144" target="_blank" >RIV/00216208:11320/12:10133144 - isvavai.cz</a>
Result on the web
<a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf12/WDS12_206_f2_Perekrestov.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf12/WDS12_206_f2_Perekrestov.pdf</a>
DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet
Original language description
Hollow cathode plasma jet (HCPJ) sputtering technique, history and comparisons with another plasma sources are reviewed in this article. Properties, characteristics and deposition features of the Ti and TixOy films are considered. The approach of quartzcrystal microbalance (QCM) usage and calibration is shown. First results of Ti/TiO2 thin films deposited on Si substrate are presented in the end.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
WDS'12 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
ISBN
978-80-7378-225-2
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
38-43
Publisher name
Matfyzpress
Place of publication
Praha
Event location
Praha
Event date
May 29, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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