Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10288012" target="_blank" >RIV/00216208:11320/14:10288012 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1021/am4049546" target="_blank" >http://dx.doi.org/10.1021/am4049546</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1021/am4049546" target="_blank" >10.1021/am4049546</a>

Result language

angličtina

Original language name

Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers

Original language description

The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show thatthe structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effect resulting in the formation of nanostructured cerium oxide films with large surface. In this regard, results of oxygen plasma treatment of a-C and CNx, films are presented. Gradual material erosion with increasing duration of plasma impact accompanied by modification of the surface roughness is repo

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GA13-10396S" target="_blank" >GA13-10396S: New materials for planar fuel cells</a><br>

Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2014

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

ACS applied materials &amp; interfaces

ISSN

1944-8244

e-ISSN

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Volume of the periodical

6

Issue of the periodical within the volume

2

Country of publishing house

US - UNITED STATES

Number of pages

6

Pages from-to

1213-1218

UT code for WoS article

000330201900065

EID of the result in the Scopus database

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