Comparison of magnetron sputtering and gas aggregation nanoparticle source used for fabrication of silver nanoparticle films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10313691" target="_blank" >RIV/00216208:11320/15:10313691 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.05.003" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2015.05.003</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.05.003" target="_blank" >10.1016/j.surfcoat.2015.05.003</a>
Alternative languages
Result language
angličtina
Original language name
Comparison of magnetron sputtering and gas aggregation nanoparticle source used for fabrication of silver nanoparticle films
Original language description
Magnetron sputtering and gas aggregation sources are commonly used techniques for the preparation of metallic nanopartides. In this study we compare both of these techniques used for the production of thin Ag nanoparticle films from the point of view oftheir morphology, topography and optical properties in dependence on the deposition time and substrate material. It is shown that in the case of sputter deposition, the morphology and optical properties of prepared films are dependent on the substrate material and deposition time and the resulting films are smooth with root-mean-square roughness 2 nm. By contrast, films produced using gas aggregation source are considerably rougher (root-mean-square roughness 12 nm) and consist of individual Ag nanoparticles. The deposition time affects in this case only the amount of nanoparticles on the surface and intensity of an anomalous absorption peak.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA13-09853S" target="_blank" >GA13-09853S: Application of low temperature plasma in a gas aggregation cluster source for deposition of nanoparticles, nanostructured and nanocomposite films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
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Volume of the periodical
275
Issue of the periodical within the volume
Neuvedeno
Country of publishing house
CH - SWITZERLAND
Number of pages
7
Pages from-to
296-302
UT code for WoS article
000357753900042
EID of the result in the Scopus database
2-s2.0-84930866652