Anomalous structural evolution and root 3x root 3 reconstruction of a clean Si(111) surface observed after thermal desorption of thallium

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319526" target="_blank" >RIV/00216208:11320/15:10319526 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1116/1.4913199" target="_blank" >http://dx.doi.org/10.1116/1.4913199</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.4913199" target="_blank" >10.1116/1.4913199</a>

Result language

angličtina

Original language name

Anomalous structural evolution and root 3x root 3 reconstruction of a clean Si(111) surface observed after thermal desorption of thallium

Original language description

The authors have observed anomalous structural evolution of a clean Si(111) surface, which was prepared first by thallium (Tl) deposition on a Si(111)7 x 7 surface, leading to incomplete formation of a Tl/Si(111)1 x 1 structure at 300 degrees C and subsequent desorption of Tl at 350 degrees C. Thus prepared clean Si(111) surfaces exhibit structural changes with increase of temperature: 2 x 1 -> (root 3 x root 3)R30 degrees -> 2 x 1 -> 5 x 5 -> 7 x 7, as observed by low-energy electron diffraction and scanning tunneling microscopy. Among the above structures, the (root 3 x root 3)R30 degrees formed at 450-550 degrees C is found not to be a simple adatom structure. Instead, by means of ab-initio calculations a new metastable (root 3 x root 3)R30 degreesreconstruction was found, having analogous structural features and formation origin to a 2 x 1 reconstruction known as the Pandey chain model. This new (root 3 x root 3)R30 degrees model is 0.09 eV per surface atom less favorable than the

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

—

Project

—

Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Vacuum Science and Technology A

ISSN

0734-2101

e-ISSN

—

Volume of the periodical

33

Issue of the periodical within the volume

2

Country of publishing house

US - UNITED STATES

Number of pages

8

Pages from-to

—

UT code for WoS article

000355739500037

EID of the result in the Scopus database

2-s2.0-84923358079