Structural and chemical characterization of cerium oxide thin layers grown on silicon substrate

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319547" target="_blank" >RIV/00216208:11320/15:10319547 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.matpr.2015.04.014" target="_blank" >http://dx.doi.org/10.1016/j.matpr.2015.04.014</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.matpr.2015.04.014" target="_blank" >10.1016/j.matpr.2015.04.014</a>

Result language
angličtina
Original language name
Structural and chemical characterization of cerium oxide thin layers grown on silicon substrate
Original language description
In this study, we report transmission electron microscopy and electron energy loss spectroscopy study of cerium oxide thin layers deposited on silicon substrate. Transmission electron microscopy experiments have revealed the flat morphology of the deposited layers. In addition, studies of high resolution images have indicated the presence of mainly ceria crystallized nanoparticles. Energy electron loss spectroscopy measurements were also performed in scanning mode to study the evolution of the cerium valence. In addition to Ce4+ inside the layer, the presence of amorphous cerium silicate with valence +3 is pointed out at the vicinity of the substrate. (C) 2015 Published by Elsevier Ltd. Selection and peer-review under responsibility of TEMA - Centre for Mechanical Technology and Automation.
Czech name
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Czech description
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Project
<a href="/en/project/GA13-10396S" target="_blank" >GA13-10396S: New materials for planar fuel cells</a><br>
Continuities
S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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