Crystalline structure and morphology of TiO2 thin films deposited by means of hollow cathode plasma jet with supporting anode

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F16%3A10327282" target="_blank" >RIV/00216208:11320/16:10327282 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1016/j.surfcoat.2016.02.026" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2016.02.026</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2016.02.026" target="_blank" >10.1016/j.surfcoat.2016.02.026</a>

Result language

angličtina

Original language name

Crystalline structure and morphology of TiO2 thin films deposited by means of hollow cathode plasma jet with supporting anode

Original language description

TiO2 thin films with developed structure were deposited by means of a hollow cathode plasma jet (HCPJ) in a DC regime with a supporting anode. The influence of the plasma temperature on the surface morphology and crystalline structure of the thin films under different deposition conditions was studied. Diagnostics of the thin films structure was carried out using XRD, SEM, EDX and TEM methods. One batch of samples was annealed at a temperature of 400 degrees C in atmospheric conditions as a comparison with the crystalline structure and morphology of unannealed samples. The presence of two crystalline polymorphs of rutile and anatase in the films was discussed. The vacuum system was improved for an extended deposition of non-conductive materials without terminating the discharge and cleaning of the deposition chamber. The aim of this investigation was to prepare the vacuum system for the fabrication of photo electrodes which are the main functional part in dye-sensitized solar cells. The test DSSCs (dye-sensitized solar cells) were prepared from low-cost materials (raspberry/hibiscus natural dye sensitizers and candle soot counter electrode) in order to check the quality of the films, with a highest conversion efficiency eta = 0.66% and a fill factor FF = 62%.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GA15-00863S" target="_blank" >GA15-00863S: A study of impulse plasmatic systems for deposition of thin layers with applications in photonics</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2016

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Volume of the periodical

271

Issue of the periodical within the volume

květen

Country of publishing house

CH - SWITZERLAND

Number of pages

7

Pages from-to

123-129

UT code for WoS article

000374609900015

EID of the result in the Scopus database

2-s2.0-84962159936