Methanol oxidation on pure and platinum-doped tungsten oxide supported by activated carbon

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10405820" target="_blank" >RIV/00216208:11320/19:10405820 - isvavai.cz</a>

Result on the web

<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=Y8Nh0Ztt1V" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=Y8Nh0Ztt1V</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.matchemphys.2019.02.042" target="_blank" >10.1016/j.matchemphys.2019.02.042</a>

Result language

angličtina

Original language name

Methanol oxidation on pure and platinum-doped tungsten oxide supported by activated carbon

Original language description

Thin films of pristine and platinum-doped tungsten oxide were examined as potential catalysts for efficient partial oxidation of methanol. The tungsten oxide layers with different thicknesses were deposited by the means of reactive magnetron sputtering on oxidized silicon wafer and silicon coated with carbon activated via ion etching. Morphology and chemical analysis were checked before and after the reaction by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). It was found that while pure tungsten oxide layers on silicon exhibit relatively small hydrogen production rates and high ratio of carbon oxides, both etched carbon interlayer (as long as the oxide thickness is low enough) and platinum doping can lead to significant improvement of reactivity, increasing hydrogen yield and decreasing fraction of undesired carbon monoxide in the product mix. It is suggested that it is due to the strong electronic interaction between WOx and Pt or active C, increasing the acidity of the tungsten oxide reaction sites and thus altering its reactivity preference from methanol dehydration towards dehydrogenation. If both species are present in a very thin oxide, however, the competing electronic interactions lead to partial reduction of their positive effect. As prepared sputtered thin films are chemically and morphologically unstable under reducing environment of methanol oxidation reaction, but the presence of dispersed Pt in the layer substantially stabilizes its physical structure.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

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Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2019

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Materials Chemistry and Physics

ISSN

0254-0584

e-ISSN

—

Volume of the periodical

228

Issue of the periodical within the volume

Apr

Country of publishing house

CH - SWITZERLAND

Number of pages

13

Pages from-to

147-159

UT code for WoS article

000468252700020

EID of the result in the Scopus database

2-s2.0-85061858834