High Power Impulse Magnetron Sputtering: Current Research and Diagnostic
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10406085" target="_blank" >RIV/00216208:11320/19:10406085 - isvavai.cz</a>
Result on the web
<a href="https://www.mff.cuni.cz/veda/konference/wds/proc/pdf19/WDS19_12_f2_Kapran.pdf" target="_blank" >https://www.mff.cuni.cz/veda/konference/wds/proc/pdf19/WDS19_12_f2_Kapran.pdf</a>
DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
High Power Impulse Magnetron Sputtering: Current Research and Diagnostic
Original language description
High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent sputtering technology used for the physical vapor deposition of thin film coatings based upon magnetron sputtering with a high voltagecurrency signt pulsed power source. Interest in the method of high-power impulse sputtering has grown steadily. Therefore, the task of first priority is to study the results of work already available in the scientific world in the field of high-power magnetron sputtering to determine the level of knowledge of this direction, as well as to identify the main trends in the development of new coating methods.This literature review outlines the state of the art in HiPIMS, as well as the foundations for more detail research of physical processes of high-power sputtering. The motivation for this review is to provide a brief summary of the HiPIMS technology, its history, its underlying physical mechanisms and diagnostic.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/GA19-00579S" target="_blank" >GA19-00579S: Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulfide layers</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
WDS'19 Proceedings of Contributed Papers — Physics
ISBN
978-80-7378-409-6
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
66-71
Publisher name
Matfyzpress
Place of publication
Praha
Event location
Praha
Event date
Jun 4, 2019
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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