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High Power Impulse Magnetron Sputtering: Current Research and Diagnostic

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10406085" target="_blank" >RIV/00216208:11320/19:10406085 - isvavai.cz</a>

  • Result on the web

    <a href="https://www.mff.cuni.cz/veda/konference/wds/proc/pdf19/WDS19_12_f2_Kapran.pdf" target="_blank" >https://www.mff.cuni.cz/veda/konference/wds/proc/pdf19/WDS19_12_f2_Kapran.pdf</a>

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    High Power Impulse Magnetron Sputtering: Current Research and Diagnostic

  • Original language description

    High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent sputtering technology used for the physical vapor deposition of thin film coatings based upon magnetron sputtering with a high voltagecurrency signt pulsed power source. Interest in the method of high-power impulse sputtering has grown steadily. Therefore, the task of first priority is to study the results of work already available in the scientific world in the field of high-power magnetron sputtering to determine the level of knowledge of this direction, as well as to identify the main trends in the development of new coating methods.This literature review outlines the state of the art in HiPIMS, as well as the foundations for more detail research of physical processes of high-power sputtering. The motivation for this review is to provide a brief summary of the HiPIMS technology, its history, its underlying physical mechanisms and diagnostic.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    <a href="/en/project/GA19-00579S" target="_blank" >GA19-00579S: Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulfide layers</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2019

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    WDS&apos;19 Proceedings of Contributed Papers — Physics

  • ISBN

    978-80-7378-409-6

  • ISSN

  • e-ISSN

  • Number of pages

    6

  • Pages from-to

    66-71

  • Publisher name

    Matfyzpress

  • Place of publication

    Praha

  • Event location

    Praha

  • Event date

    Jun 4, 2019

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article