Immobilization of Chitosan Onto Polypropylene Foil via Air/Solution Atmospheric Pressure Plasma Afterglow Treatment
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F20%3A10420946" target="_blank" >RIV/00216208:11320/20:10420946 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=9wmRm1hQ5J" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=9wmRm1hQ5J</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s11090-019-10029-2" target="_blank" >10.1007/s11090-019-10029-2</a>
Alternative languages
Result language
angličtina
Original language name
Immobilization of Chitosan Onto Polypropylene Foil via Air/Solution Atmospheric Pressure Plasma Afterglow Treatment
Original language description
The combination of an atmospheric pressure plasma afterglow operated in air with wet grafting was utilized for the immobilization of chitosan on the surface of polypropylene foil. The plasma treatment results in a local modification of polymer surface along the sample axis with a modified zone of width 2 cm. Moreover, plasma treatment initiates etching and melting of the polymer on micro-level. Processing in combination with chitosan solution in-line prevents thermal effects and results in the formation of island-like chitosan structures. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR) reveal the presence of chemical groups typical for chitosan structure.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
<a href="/en/project/LM2018116" target="_blank" >LM2018116: Surface Physics Laboratory - Materials Science Beamline</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Chemistry and Plasma Processing
ISSN
0272-4324
e-ISSN
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Volume of the periodical
40
Issue of the periodical within the volume
1
Country of publishing house
US - UNITED STATES
Number of pages
14
Pages from-to
207-220
UT code for WoS article
000511964200011
EID of the result in the Scopus database
2-s2.0-85073794644