Probing the Roughness of Porphyrin Thin Films with X-ray Photoelectron Spectroscopy
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F20%3A10423824" target="_blank" >RIV/00216208:11320/20:10423824 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=FA9qzZJIGX" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=FA9qzZJIGX</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/cphc.202000568" target="_blank" >10.1002/cphc.202000568</a>
Alternative languages
Result language
angličtina
Original language name
Probing the Roughness of Porphyrin Thin Films with X-ray Photoelectron Spectroscopy
Original language description
Thin-film growth of molecular systems is of interest for many applications, such as for instance organic electronics. In this study, we demonstrate how X-ray photoelectron spectroscopy (XPS) can be used to study the growth behavior of such molecular systems. In XPS, coverages are often calculated assuming a uniform thickness across a surface. This results in an error for rough films, and the magnitude of this error depends on the kinetic energy of the photoelectrons analyzed. We have used this kinetic-energy dependency to estimate the roughnesses of thin porphyrin films grown on rutile TiO2(110). We used two different molecules: cobalt (II) monocarboxyphenyl-10,15,20-triphenylporphyrin (CoMCTPP), with carboxylic-acid anchor groups, and cobalt (II) tetraphenylporphyrin (CoTPP), without anchor groups. We find CoMCTPP to grow as rough films at room temperature across the studied coverage range, whereas for CoTPP the first two layers remain smooth and even; depositing additional CoTPP results in rough films. Although, XPS is not a common technique for measuring roughness, it is fast and provides information of both roughness and thickness in one measurement.
Czech name
—
Czech description
—
Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/LM2015057" target="_blank" >LM2015057: Surface Physics Laboratory – Materials Science Beamline</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Chemphyschem : a European journal of chemical physics and physical chemistry
ISSN
1439-4235
e-ISSN
—
Volume of the periodical
21
Issue of the periodical within the volume
20
Country of publishing house
DE - GERMANY
Number of pages
8
Pages from-to
2293-2300
UT code for WoS article
000572508800001
EID of the result in the Scopus database
2-s2.0-85091534220