Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F22%3A10448124" target="_blank" >RIV/00216208:11320/22:10448124 - isvavai.cz</a>
Alternative codes found
RIV/00216224:14310/22:00128099
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=9iP3uBzPyp" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=9iP3uBzPyp</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1103/PhysRevE.106.035302" target="_blank" >10.1103/PhysRevE.106.035302</a>
Alternative languages
Result language
angličtina
Original language name
Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition
Original language description
We present a numerical model of epitaxial thin-film growth applicable for pulsed-laser deposition on a single crystalline substrate. The model is based on rate equations describing the time development of monolayer coverages and of densities of movable particles on atomically flat terraces. Numerical solution of the equations showed that the time dependence of surface roughness obeys a scaling law, the exponent of which depends on probabilities of various atomistic processes included in the simulation model. From the time dependence of monolayer coverages we calculated x-ray diffracted intensity in a quasiforbidden anti-Bragg reflection and showed that its oscillatory behavior is affected by these probabilities as well. The results show the possibility to study atomistic processes during the deposition from the time dependence of the anti-Bragg intensity measured during deposition.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/GC19-10799J" target="_blank" >GC19-10799J: In-situ study of the growth kinetics of pulsed laser deposition of multiferroic complex oxides</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Physical Review E
ISSN
2470-0045
e-ISSN
2470-0053
Volume of the periodical
106
Issue of the periodical within the volume
3
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
035302
UT code for WoS article
000874981300004
EID of the result in the Scopus database
2-s2.0-85138450301