Photoelectron spectroscopy study of Pu thin films on Si
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F25%3A10499671" target="_blank" >RIV/00216208:11320/25:10499671 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=-fbnqyYbzc" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=-fbnqyYbzc</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/6.0004503" target="_blank" >10.1116/6.0004503</a>
Alternative languages
Result language
angličtina
Original language name
Photoelectron spectroscopy study of Pu thin films on Si
Original language description
X-ray photoelectron spectroscopy and high-resolution ultraviolet photoelectron spectroscopy studies were performed on Pu sputter deposited on Si. The intermixing of Pu with Si at deposition can produce different types of Pu-Si systems, which can be subsequently modified by Ar+ ion bombardment. Annealing of thick Pu films leads to a reaction and formation of a compound with stoichiometry approximately PuSi2. Three pronounced narrow spectral features in the energy range to 1 eV below the Fermi energy, which exhibit an anomalous temperature dependence, can be attributed to the 5f(5) final-state multiplet, originating from the 5f(6) admixture in the ground state. (c) 2025 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science and Technology A
ISSN
0734-2101
e-ISSN
1520-8559
Volume of the periodical
43
Issue of the periodical within the volume
4
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
043414
UT code for WoS article
001522173600001
EID of the result in the Scopus database
2-s2.0-105009778660