Annealing Effects on Fractal Analysis and Optical Nonlinearity in Pulsed Laser-Deposited Plasmonic Cu Thin Films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F25%3A10503841" target="_blank" >RIV/00216208:11320/25:10503841 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=QhMn8BPdxi" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=QhMn8BPdxi</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s11468-025-02835-6" target="_blank" >10.1007/s11468-025-02835-6</a>
Alternative languages
Result language
angličtina
Original language name
Annealing Effects on Fractal Analysis and Optical Nonlinearity in Pulsed Laser-Deposited Plasmonic Cu Thin Films
Original language description
This study explores the effect of surface growth parameters on the plasmonic and nonlinear optical (NLO) properties of as-deposited and annealed copper (Cu) thin films. Growth parameters were derived from power spectral density functions (PSDFs) of AFM micrographs and modeled using a Gaussian approach with fractal characteristics to extract key surface metrics. The micro-roughness of as-deposited films annealed at 4-, 6-, and 8-min deposition durations increased from 0.27 to 8.57 nm, 0.95 to 7.29 nm, and 0.89 to 3.79 nm, respectively. With annealing, fractal behavior transitioned from extreme to Brownian, while activation energy exhibited two distinct values across temperature regimes, reflecting surface diffusion processes. Gradually annealed films showed both longitudinal and transverse plasmonic peaks in absorption spectra. Third-order NLO properties are analyzed via the Z-scan technique at 632.8 nm. While as-deposited films lacked detectable optical nonlinearity, annealed films exhibited positive nonlinear refractive indices (n2) on the order of 10-4 cm/W, increasing with annealing temperature. These results connect fractal surface morphology to enhanced plasmonic and NLO responses, offering insights for functional material design.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10402 - Inorganic and nuclear chemistry
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasmonics
ISSN
1557-1955
e-ISSN
1557-1963
Volume of the periodical
2025
Issue of the periodical within the volume
březen
Country of publishing house
US - UNITED STATES
Number of pages
12
Pages from-to
nestránkováno
UT code for WoS article
001448796600001
EID of the result in the Scopus database
2-s2.0-105000408231