The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F01%3A00004618" target="_blank" >RIV/00216224:14310/01:00004618 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge
Original language description
The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA202%2F00%2FP037" target="_blank" >GA202/00/P037: Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of 15th International Symposium on Plasma Chemistry
ISBN
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ISSN
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e-ISSN
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Number of pages
6
Pages from-to
1835
Publisher name
GREMI, CNRS/University of Orleans
Place of publication
Orleans (France)
Event location
Orleans (France)
Event date
Jan 1, 2001
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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