Modeling of optical constants of organosilicon thin films by parameterization of denstity of states

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F06%3A00018470" target="_blank" >RIV/00216224:14310/06:00018470 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Modeling of optical constants of organosilicon thin films by parameterization of denstity of states

Original language description

Modeling of optical constants of organosilicon thin films by parameterization of denstity of states

Czech name

Modelovani optickych konstant organosilikonovych vrstev pomoci paramtrizave hustoty stavu

Czech description

Modelovani optickych konstant organosilikonovych vrstev pomoci paramtrizave hustoty stavu

Type

D - Article in proceedings

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/1K05025" target="_blank" >1K05025: Synthesis of new Si-O(N)-C materials by plasma enhanced CVD</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2006

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

4th Workshop Ellipsometry

ISBN

3-00-018751-0

ISSN

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e-ISSN

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Number of pages

1

Pages from-to

110-111

Publisher name

Uwe Beck

Place of publication

Berlin

Event location

Berlin

Event date

Feb 22, 2006

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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