Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F08%3A00025189" target="_blank" >RIV/00216224:14310/08:00025189 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge

Original language description

Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of thecommon techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aimof this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.

Czech name

Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge

Czech description

Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of thecommon techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aimof this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.

Type

O - Miscellaneous

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GA202%2F07%2F1669" target="_blank" >GA202/07/1669: Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2008

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů