Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00050415" target="_blank" >RIV/00216224:14310/11:00050415 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
Original language description
Waveforms of discharge voltage and current and their changes induced by changes of plasma parameters (namely during deposition processes) were studied.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA202%2F07%2F1669" target="_blank" >GA202/07/1669: Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů