The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00055017" target="_blank" >RIV/00216224:14310/11:00055017 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.vacuum.2010.12.011" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2010.12.011</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2010.12.011" target="_blank" >10.1016/j.vacuum.2010.12.011</a>
Alternative languages
Result language
angličtina
Original language name
The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings
Original language description
The influence of the deposition parameters on the growth, structure and mechanical properties of the TiBx coatings are studied. The TiBx coatings represent a nanocomposite system, in which random or oriented TiB2 nanocrystallites are embedded in an amorphous matrix as is revealed by cross-sectional transmission electron microscopy. We show that low-energy ion bombardment (Ei) of growing TiBx coating influences the preferred orientation of TiB2 crystallites. The increasing of ion current density (is) bymeans of negative substrate bias voltage (Us) leads to change from random to the (0001) preferred crystal orientation whereby the electrical biasing promotes crystal growth in the coating and the (0001) texture appears gradually during the film growth. Together with the (0001) preferred orientation selection the composition B/Ti ratio was changed from 2.9 (floating potential, Ei=8eV) to 2.4 (Ei=94eV).
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
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Volume of the periodical
85
Issue of the periodical within the volume
9
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
5
Pages from-to
866-870
UT code for WoS article
000289181700004
EID of the result in the Scopus database
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