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Synthesis and Characterization of Nanostructured a-C:H (Hydrogenated Amorphous Carbon) Thin Films by Gaseous Thermionic Vacuum Arc (G-TVA) Deposition Technique

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00057078" target="_blank" >RIV/00216224:14310/12:00057078 - isvavai.cz</a>

  • Result on the web

    <a href="http://www.springerlink.com/content/6847745758555587/fulltext.pdf" target="_blank" >http://www.springerlink.com/content/6847745758555587/fulltext.pdf</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1007/s11090-011-9344-x" target="_blank" >10.1007/s11090-011-9344-x</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Synthesis and Characterization of Nanostructured a-C:H (Hydrogenated Amorphous Carbon) Thin Films by Gaseous Thermionic Vacuum Arc (G-TVA) Deposition Technique

  • Original language description

    The aim of this contribution is to present the properties of the nanostructured hydrogenated carbon thin films and to study their growth carried out in a special deposition technique based on Thermionic Vacuum Arc method. The Gaseous Thermionic Vacuum Arc (G-TVA) technology is an original deposition method performed in a special configuration, consisting of a heated thermionic cathode which provides an electron beam on the anode. The surface free energy was evaluated by contact angle and their optical properties were studied by Filmetrics F20 spectrometry system. Structure of the film has been investigated by Raman spectroscopy as well as the mechanical properties like hardness, wear resistance, film-substrate adhesion. The films showed two distinct Raman characteristic peaks located at 1,350 cm -1 (D-line) and 1,550 cm -1 (G-line), broad for Si and very sharp for glass substrates. The G-TVA enables to prepare soft (hardness ~6 GPa) or hard (~24 GPa) films.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/KAN311610701" target="_blank" >KAN311610701: Nanometrology using methods of scanning probe microscopy</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Chemistry and Plasma Processing

  • ISSN

    0272-4324

  • e-ISSN

  • Volume of the periodical

    32

  • Issue of the periodical within the volume

    2

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    11

  • Pages from-to

    219-229

  • UT code for WoS article

    000304173100005

  • EID of the result in the Scopus database