Modelling of Reactive Magnetron Sputtering with Focus on Changes in Target Utilization
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00058617" target="_blank" >RIV/00216224:14310/12:00058617 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Modelling of Reactive Magnetron Sputtering with Focus on Changes in Target Utilization
Original language description
The paper deals with modelling of reactive magnetron sputtering of titanium with focus on changes in target utilization.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Chemické listy
ISSN
0009-2770
e-ISSN
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Volume of the periodical
106
Issue of the periodical within the volume
S
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
6
Pages from-to
"s1482"-"s1487"
UT code for WoS article
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EID of the result in the Scopus database
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