THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00064658" target="_blank" >RIV/00216224:14310/12:00064658 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA
Original language description
Plasma generated by DCSBD was investigated for cleaning and removing of organic contaminants from semiconductor materials. ITO glass used in photovoltaics and three types of most often used silicon surfaces in semiconductor industry ? precleaned silicon,thermally oxidized silicon and H-terminated silicon was studied. The changes in chemical bonds on silicon surfaces were investigated by FTIR. Removing of IPA from silicon substrates was observed by XPS measurements. Effectivity of DCSBD as cleaning agent in comparison with isopropylacohol was investigated on ITO glass samples by XPS measurement.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0086" target="_blank" >ED2.1.00/03.0086: Regional R&D center for low-cost plasma and nanotechnology surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
CHEMICKÉ LISTY
ISSN
0009-2770
e-ISSN
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Volume of the periodical
106
Issue of the periodical within the volume
S
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
5
Pages from-to
1455-1459
UT code for WoS article
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EID of the result in the Scopus database
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