Measurement of hydroxyl radical (OH) concentration in argon RF plasma jet by laser-induced fluorescence

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F13%3A00067996" target="_blank" >RIV/00216224:14310/13:00067996 - isvavai.cz</a>

Result on the web

<a href="http://iopscience.iop.org/0963-0252/22/2/025016" target="_blank" >http://iopscience.iop.org/0963-0252/22/2/025016</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/22/2/025016" target="_blank" >10.1088/0963-0252/22/2/025016</a>

Result language

angličtina

Original language name

Measurement of hydroxyl radical (OH) concentration in argon RF plasma jet by laser-induced fluorescence

Original language description

The concentration of hydroxyl (OH) radicals in a plasma pencil, an atmospheric RF plasma jet ignited in argon, was measured by laser-induced fluorescence calibrated by Rayleigh scattering on ambient air. A suitable excitation scheme for this discharge was suggested based on laser excitation to the lowest vibrational level of the A 2Sigma+ state. Effects of spectral overlap between the laser and absorption line, fluorescence saturation, temporal evolution of fluorescence radiation, rotational energy transfer and rotational distribution on the diagnostic method were analysed. The maximum OH concentration was approximately 5E+20 m-3. The maximum was reached when the measurement point localized in the effluent of the plasma pencil was inside but close to the tip of the visible active discharge.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/ED2.1.00%2F03.0086" target="_blank" >ED2.1.00/03.0086: Regional R&D center for low-cost plasma and nanotechnology surface modifications</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

PLASMA SOURCES SCIENCE &amp; TECHNOLOGY

ISSN

0963-0252

e-ISSN

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Volume of the periodical

22

Issue of the periodical within the volume

2

Country of publishing house

GB - UNITED KINGDOM

Number of pages

9

Pages from-to

025016

UT code for WoS article

000317275400018

EID of the result in the Scopus database

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