Spatially resolved spectroscopy of atmospheric pressure microwave plasma jet used for surface treatment
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F13%3A00074772" target="_blank" >RIV/00216224:14310/13:00074772 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Spatially resolved spectroscopy of atmospheric pressure microwave plasma jet used for surface treatment
Original language description
Material processing and modification by plasma enjoys ever increasing interest of industry. Mostly for the surface related applications, OH radical is the essential element that initiates the reactions and enhances hydrophilic properties of the surface.The information about its distribution in plasma can be a valuable clue for the most effective treatment. We have investigated OH band relative intensity 2D profiles in atmospheric pressure microwave plasma jet - surfatron - by means of optical emissionspectroscopy (OES).
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0086" target="_blank" >ED2.1.00/03.0086: Regional R&D center for low-cost plasma and nanotechnology surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů