Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F15%3A00080658" target="_blank" >RIV/00216224:14310/15:00080658 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/0022-3727/48/6/065201" target="_blank" >http://dx.doi.org/10.1088/0022-3727/48/6/065201</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0022-3727/48/6/065201" target="_blank" >10.1088/0022-3727/48/6/065201</a>
Alternative languages
Result language
angličtina
Original language name
Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model
Original language description
This work presents a numerical model of hydrogen plasma in a microwave coaxial discharge at low pressure (25?250 Pa). The model is a mixed two-dimensional (2D)/three-dimensional (3D) model in that it combines three-dimensional geometry for the electromagnetic field and two-dimensional geometry for the transport equations. The model is validated against experimental results available in the literature and, where possible, simulations of comparable discharges. The model shows reasonable agreement in the relevant pressure range. A parametric study with respect to pressure is carried out and it is observed that the plasma contracts towards the quartz tube with increasing pressure. Increasing the pressure also influences the abundance of H + ions but on theother hand it has little impact on hydrogen dissociation degree and electron temperature. Furthermore, the uniformity of the plasma above the substrate holder is analyzed.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GAP205%2F12%2F0908" target="_blank" >GAP205/12/0908: Advanced experimental research of large area microwave plasma system for deposition of nanocrystalline diamond films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of physics D: Applied physics
ISSN
0022-3727
e-ISSN
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Volume of the periodical
48
Issue of the periodical within the volume
6
Country of publishing house
GB - UNITED KINGDOM
Number of pages
17
Pages from-to
"nestránkováno"
UT code for WoS article
000348842600006
EID of the result in the Scopus database
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