Low temperature temporal and spatial atomic layer deposition of TiO2 films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F15%3A00083408" target="_blank" >RIV/00216224:14310/15:00083408 - isvavai.cz</a>
Result on the web
<a href="http://scitation.aip.org/content/avs/journal/jvsta/33/4/10.1116/1.4922588" target="_blank" >http://scitation.aip.org/content/avs/journal/jvsta/33/4/10.1116/1.4922588</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.4922588" target="_blank" >10.1116/1.4922588</a>
Alternative languages
Result language
angličtina
Original language name
Low temperature temporal and spatial atomic layer deposition of TiO2 films
Original language description
Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as coreactants.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science & Technology A
ISSN
0734-2101
e-ISSN
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Volume of the periodical
33
Issue of the periodical within the volume
4
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
"nestránkováno"
UT code for WoS article
000357826400024
EID of the result in the Scopus database
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