Dispersion model for optical thin films applicable in wide spectral range

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F15%3A00094360" target="_blank" >RIV/00216224:14310/15:00094360 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1117/12.2190104" target="_blank" >http://dx.doi.org/10.1117/12.2190104</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1117/12.2190104" target="_blank" >10.1117/12.2190104</a>

Result language

angličtina

Original language name

Dispersion model for optical thin films applicable in wide spectral range

Original language description

In the optics industry thin film systems are used to construct various interference devices such as antireflective coatings, high-reflectance mirrors, beam splitters and filters. The optical characterization of complex optical systems can not be performed by measurements only in the short spectral range in which the interference devices will be employed because the measured data do not contain sufficient information about all relevant parameters of these systems. The characterization of film materials requires the extension of the spectral range of the measurements to the IR region containing phonon absorption and to the UV region containing the electronic excitations. However, this leads to necessity of a dispersion model suitable for the description of the dielectric response in the wide spectral range. Such model must respect the physical conditions following from theory of dispersion, particularly Kramers-Kronig relations and integrability imposed by sum rules. This work presents the construction of a universal dispersion model composed from individual contributions representing both electronic and phonon excitations. The efficiency of presented model is given by the fact that all the contributions are described by analytical expressions. It is shown that the model is suitable for precise modeling of spectral dependencies of optical constants of a broad class of materials used in the optical industry for thin film systems such as MgF2, SiO2, Al2O3, HfO2, Ta2O5 and TiO2 in the spectral range from far IR to vacuum UV.

Czech name

—

Czech description

—

Type

D - Article in proceedings

CEP classification

—

OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V

ISBN

9781628418170

ISSN

0277-786X

e-ISSN

—

Number of pages

12

Pages from-to

„96281U-1“-„96281U-12“

Publisher name

SPIE-INT SOC OPTICAL ENGINEERING

Place of publication

BELLINGHAM, USA

Event location

Jena, GERMANY

Event date

Sep 7, 2015

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

000366832100044