Preparation of Hard Yet Moderately Ductile Mo2BC Thin Films by Pulsed-DC Magnetron Sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F16%3A00088161" target="_blank" >RIV/00216224:14310/16:00088161 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Preparation of Hard Yet Moderately Ductile Mo2BC Thin Films by Pulsed-DC Magnetron Sputtering
Original language description
A thin film deposited on the surface of a tool can substantially influence its durability and performance. The most frequently used coatings in industry are ceramic coatings with great hardness and stiffness. However, these coatings are quite brittle, which can cause the formation and spreading of cracks. To prevent the formation of cracks, the material of the film should exhibit ductile behaviour. The combination of high hardness and moderate ductility has been discovered in the nanolaminate Mo2BC. Mid frequency pulsed-DC magnetron sputtering was used to deposit thin Mo2BC films. This method was chosen, because it is relatively simple and therefore industry-friendly.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů