Pulsed-DC Magnetron Sputtering Process for Low Temperature Deposition of Hard Yet Moderately Ductile MoBC Coatings
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F16%3A00088512" target="_blank" >RIV/00216224:14310/16:00088512 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Pulsed-DC Magnetron Sputtering Process for Low Temperature Deposition of Hard Yet Moderately Ductile MoBC Coatings
Original language description
Current state-of- materials nowadays used as protective coatings such as TiN, TiAlN, c-BN etc. generally exhibit high hardness and high stiffness. These positive features are often accompanied by undesirable brittle deformation behaviour. To overcome this limitation a new generation of materials with high hardness coupled with moderate ductility is desired.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů