Temporal evolution of Ti sputtered species number densities in multi-pulse HiPIMS process

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00094831" target="_blank" >RIV/00216224:14310/17:00094831 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Temporal evolution of Ti sputtered species number densities in multi-pulse HiPIMS process
Original language description
The aim of this paper is to study the temporal evolutions of sputtered species number densities during a preceding (P) and a subsequent (S) pulse in a multi-pulse HiPIMS. The Ti atom number density does not reach the maximum at the time of the maximal discharge current. It is shown that the residual particles from the P pulse are presented at the beginning of the S pulse even for the longest studied delay between the P and the S pulse. The ionization fractions of sputtered species attained at the end of the S pulses are always lower compared to the P pulse. The coatings produced by multi-pulse HiPIMS exhibited decreased roughness and increased hardness in comparison with standard HiPIMS and DC magnetron sputtered coating.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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