Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00097338" target="_blank" >RIV/00216224:14310/17:00097338 - isvavai.cz</a>

Result on the web

<a href="http://aip.scitation.org/doi/abs/10.1063/1.4973945" target="_blank" >http://aip.scitation.org/doi/abs/10.1063/1.4973945</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4973945" target="_blank" >10.1063/1.4973945</a>

Result language

angličtina

Original language name

Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Original language description

Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

AIP Advances

ISSN

2158-3226

e-ISSN

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Volume of the periodical

7

Issue of the periodical within the volume

5

Country of publishing house

US - UNITED STATES

Number of pages

7

Pages from-to

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UT code for WoS article

000402797100281

EID of the result in the Scopus database

2-s2.0-85009186297