All

What are you looking for?

All
Projects
Results
Organizations

Quick search

  • Projects supported by TA ČR
  • Excellent projects
  • Projects with the highest public support
  • Current projects

Smart search

  • That is how I find a specific +word
  • That is how I leave the -word out of the results
  • “That is how I can find the whole phrase”

Controlled fabrication and electrowetting properties of silicon nanostructures

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00112267" target="_blank" >RIV/00216224:14310/17:00112267 - isvavai.cz</a>

  • Result on the web

    <a href="https://www.tandfonline.com/doi/abs/10.1080/01694243.2016.1199340" target="_blank" >https://www.tandfonline.com/doi/abs/10.1080/01694243.2016.1199340</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1080/01694243.2016.1199340" target="_blank" >10.1080/01694243.2016.1199340</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Controlled fabrication and electrowetting properties of silicon nanostructures

  • Original language description

    Electrowetting on dielectric is of particular interest in various applications including digital microFLuidics, optics, displays and inanalysis of biological samples. In this paper, Ag-assisted etching of silicon has been used to prepare superhydrophobic surfaces that may add unique properties to such devices. The porosity is controlled by controlling the size of the Ag deposited on the surface. Etching is carried out in HF/H2O2 solution. From the SEM images, the small-sized Ag particles are found to produce a very porous irregular surface, while the larger Ag-sized particles deposited resulted in regular vertical nanostructures. The fabricated surface was chemically modified with fluoro alkyl silane to make it superhydrophobic. Wetting behaviour was studied by measuring the contact angle and contact angle hysteresis. The contact angle measured was greater than 150 degrees and contact angle hysteresis was less than five. Electrowetting was studied by applying DC voltage between the droplet and silicon substrate.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20900 - Industrial biotechnology

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2017

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY

  • ISSN

    0169-4243

  • e-ISSN

    1568-5616

  • Volume of the periodical

    31

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    10

  • Pages from-to

    31-40

  • UT code for WoS article

    000386328700004

  • EID of the result in the Scopus database

    2-s2.0-84976260236