Enhancement of electrical properties of flexible ITO/PET by atmospheric pressure roll-to-roll plasma
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00102122" target="_blank" >RIV/00216224:14310/18:00102122 - isvavai.cz</a>
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S1369800117319601" target="_blank" >https://www.sciencedirect.com/science/article/pii/S1369800117319601</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.mssp.2017.11.022" target="_blank" >10.1016/j.mssp.2017.11.022</a>
Alternative languages
Result language
angličtina
Original language name
Enhancement of electrical properties of flexible ITO/PET by atmospheric pressure roll-to-roll plasma
Original language description
Flexible materials can significantly reduce the cost of the electronic devices because they can be manufactured by large-area roll-to-roll (R2R) processing. In this work, R2R atmospheric pressure plasma was used to modify flexible indium-tin-oxide films on polyethylene terephthalate foil (ITO/PET). Plasma treatment was performed in different feed gases consisting of various ratio between nitrogen and oxygen. A range of experimental techniques were used to study surface properties of ITO/PET, including X-ray and Ultraviolet photoelectron spectroscopies, four-point probe, Atomic force microscopy and UV–Vis measurement. We found that R2R plasma treatment decreased carbon contamination and increased the number of oxygen vacancies on the surface, whereas the ratio between indium and tin remained constant. UPS showed an increase in the work function from 3.9 eV for untreated sample to 5.1 eV for sample treated in plasma for very short time of 2 s.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Materials Science in Semiconductor Processing
ISSN
1369-8001
e-ISSN
1873-4081
Volume of the periodical
75
Issue of the periodical within the volume
N/A
Country of publishing house
GB - UNITED KINGDOM
Number of pages
8
Pages from-to
95-102
UT code for WoS article
000424934600013
EID of the result in the Scopus database
2-s2.0-85034778395