The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00103777" target="_blank" >RIV/00216224:14310/18:00103777 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings
Original language description
Nanocomposite coatings consisting of nanocrystallites embedded in an amorphous matrix such as nc-TiC/a-C:H can be tailored to exhibit an unusual combination of properties like high hardness and elastic modulus combined with low friction and wear. These coatings are usually deposited utilising direct current magnetron sputtering (DCMS) leading to low ionisation of the sputtered titanium and to lower Ar+ ion bombardment impinging the growing coating. The ion bombardment of the substrates is routinely enhanced via increasing the energy of the bombarding ions due to the application of a negative bias onto the samples. The use of high power impulse magnetron sputtering (HiPIMS) usually leads to much higher ionisation of the sputtered titanium which can alter the deposition process and to more severe ion bombardment of the growing coating changing the properties of the deposited coatings.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů