Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F19%3A00109216" target="_blank" >RIV/00216224:14310/19:00109216 - isvavai.cz</a>

Result on the web

<a href="https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ab0363" target="_blank" >10.1088/1361-6595/ab0363</a>

Result language

angličtina

Original language name

Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

Original language description

Reactive high power impulse magnetron sputtering offers a great opportunity for high quality coating production, thus understanding the processes accompanying deposition is of great importance. In this paper, the evolution of numerous discharge parameters such as total pressure, discharge current and sputtered species number densities are studied in argon with oxygen, nitrogen or acetylene admixture. The experiments are compared to the reactive direct current magnetron sputtering where the deposition process usually exhibits hysteresis behaviour and the ionization fraction of sputtered species is significantly lower. The decrease in the titanium atom and ion number densities with the increasing degree of target poisoning is detected for all the studied admixtures. However, while the sputtered species number densities decrease the sputtered species ionization fraction increases. Depending on the reactive gas admixture, the ionization fraction of the sputtered species increases from 75% achieved in pure argon discharge up to 90% attained in the poisoned mode of the reactive sputtering. This increase was the most pronounced for oxygen and nitrogen admixtures. Mutual comparison of the reactive sputtering with nitrogen, oxygen and acetylene indicated multiple causes for the observed increase.

Czech name

—

Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2019

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Volume of the periodical

28

Issue of the periodical within the volume

2

Country of publishing house

GB - UNITED KINGDOM

Number of pages

11

Pages from-to

1-11

UT code for WoS article

000460060600001

EID of the result in the Scopus database

2-s2.0-85065739855