Optimization of TiO2 Mesoporous Photoanodes Prepared by Inkjet Printing and Low-Temperature Plasma Processing
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F20%3A00114247" target="_blank" >RIV/00216224:14310/20:00114247 - isvavai.cz</a>
Alternative codes found
RIV/00216305:26310/20:PU139550
Result on the web
<a href="https://doi.org/10.1007/s11090-020-10086-y" target="_blank" >https://doi.org/10.1007/s11090-020-10086-y</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s11090-020-10086-y" target="_blank" >10.1007/s11090-020-10086-y</a>
Alternative languages
Result language
angličtina
Original language name
Optimization of TiO2 Mesoporous Photoanodes Prepared by Inkjet Printing and Low-Temperature Plasma Processing
Original language description
This study describes and evaluates a low-temperature method for ambient-air plasma fabrication of hybrid titania/silica nanocomposite mesoporous layers that generate and transport electrons. The mesoporous layers were prepared using wet coating with a dispersion consisting of prefabricated titania nanoparticles and polysiloxane binder, subsequently inkjet-printed and plasma-processed by diffuse coplanar surface barrier discharge, to form an almost inorganic titania/silica coating of the high specific surface. The study demonstrates approaches to optimization of the coating, using various TiO2 nanoparticles, and of the plasma processing, together with the economic significance of printing and plasma processing-an approach compatible with processes envisaged for the manufacture of flexible electronics.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Chemistry and Plasma Processing
ISSN
0272-4324
e-ISSN
1572-8986
Volume of the periodical
40
Issue of the periodical within the volume
5
Country of publishing house
US - UNITED STATES
Number of pages
20
Pages from-to
1311-1330
UT code for WoS article
000534878200001
EID of the result in the Scopus database
2-s2.0-85085336286