Dynamics of sputtered particles in multipulse HiPIMS discharge

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F23%3A00130646" target="_blank" >RIV/00216224:14310/23:00130646 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1088/1361-6595/acc686" target="_blank" >https://doi.org/10.1088/1361-6595/acc686</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/acc686" target="_blank" >10.1088/1361-6595/acc686</a>

Result language
angličtina
Original language name
Dynamics of sputtered particles in multipulse HiPIMS discharge
Original language description
The behavior of the ground state neutral and singly ionized atoms is studied in multipulse high power impulse magnetron sputtering processes. The time-resolved two-dimensional laser induced fluorescence was used for imaging the discharge volume (density mapping) during the plasma-on and plasma-off time phases. The role of the number of micropulses and delay time between the micropulses in the pulse package is analyzed and discussed systematically. In addition, the propagation of the sputtered particles from the target is investigated.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)

Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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