Effects of DC bias on the PECVD deposition of thin films from octamethylcyclotetrasiloxane (OMTS) and oxygen mixtures
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F95%3A00000360" target="_blank" >RIV/00216224:14310/95:00000360 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Effects of DC bias on the PECVD deposition of thin films from octamethylcyclotetrasiloxane (OMTS) and oxygen mixtures
Original language description
Effects of DC bias on the PECVD deposition of thin films from octamethylcyclotetrasiloxane (OMTS) and oxygen mixtures
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
1995
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of 17th Symposium on Plasma Physics and Technology
ISBN
80-010-1344-8
ISSN
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e-ISSN
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Number of pages
3
Pages from-to
293
Publisher name
ČVUT Praha
Place of publication
Prague (Czech Rep.)
Event location
Prague (Czech Rep.)
Event date
Jan 1, 1995
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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